EUV Lithography (TWINSCAN NXE)
Active
ASML


Overview
The 0.33 NA extreme-ultraviolet scanners that are the only tools on Earth capable of patterning leading-edge chips from 7nm down to 2nm. The latest NXE:3800E runs 220 wafers per hour — 37% faster than its predecessor — at roughly $180M per machine; 48 EUV systems were recognized in 2025 revenue.
Shipping at scale — 60+ EUV shipments planned for 2026 on surging logic and DRAM demand